Chemisorption of fluorine onto the cluster modelled Si(111)7 × 7 surface: An ab initio Hartree-Fock/DFT study

Surface Science

Volumn 351, Issue 1-3, 1996, Pages 75-86

  Radny, M W ^a   Smith, P V ^a   Cao, P L ^b  

^a UNIVERSITY OF NEWCASTLE   (Australia)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Ab initio quantum chemical methods and calculations; Chemisorption; Etching; Fluorine; Models of surface chemical reactions; Silicon; Single crystal surfaces; Surface chemical reaction; Surface structure

Indexed keywords

ADATOM SITES; ATOMIC CLUSTERS; REST ATOM SITES;

CHEMICAL BONDS; CHEMICAL REACTIONS; CHEMISORPTION; CRYSTAL ATOMIC STRUCTURE; DESORPTION; ETCHING; FLUORINE; MATHEMATICAL MODELS; SINGLE CRYSTALS; SURFACE STRUCTURE;

SEMICONDUCTING SILICON;

EID: 0030146159     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01353-9     Document Type: Article

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