Pulsed laser processing of carbon and silicon clusters and thin films

Fullerene Science and Technology

Volumn 4, Issue 3, 1996, Pages 599-612

  Koinuma, Hideomi ^a   Kim, Min Sung ^a   Asakawa, Toshiaki ^a   Yoshimoto, Mamoru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; EVAPORATION; EXCIMER LASERS; FILM PREPARATION; LASER BEAMS; MASS SPECTROMETRY; PULSED LASER APPLICATIONS; SILICON; SPECIMEN PREPARATION; THIN FILMS; TRIBOLOGY;

CLATHRATE; LASER DESORPTION TIME OF FLIGHT MASS SPECTROMETRY; PULSED ABLATION; SEGREGATIVE CLUSTER ANALYSIS; STAINLESS STEEL RODS; THIN FILM DEPOSITION;

FULLERENES;

EID: 0030145210     PISSN: 1064122X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10641229608001573     Document Type: Article

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