Cu(111) electron band structure and channeling by VLEED

Surface Science

Volumn 352-354, Issue , 1996, Pages 660-664

  Bartos I ^a   Van Hove, M A ^b   Altman, M S ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Copper; Diffraction; Electron solid interactions; Low energy electron diffraction (LEED); Low energy electron microscopy; Low index single crystal surfaces; Metallic surfaces; Scattering

Indexed keywords

ANISOTROPY; ATTENUATION; BAND STRUCTURE; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON ABSORPTION; ELECTRON DIFFRACTION; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRON SCATTERING; SINGLE CRYSTALS; SURFACE PHENOMENA;

CURRENT VOLTAGE CURVES; ELECTRON ATTENUATION; ELECTRON CHANNELING; ELECTRON SOLID INTERACTIONS; LOW ENERGY ELECTRON MICROSCOPE; LOW INDEX SINGLE CRYSTAL SURFACES; METALLIC SURFACES; VERY LOW ENERGY ELECTRON DIFFRACTION;

COPPER;

EID: 0030145156     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01204-4     Document Type: Article

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