Adsorption of elemental S on Si(100)-2 × 1 surfaces

Surface Science

Volumn 352-354, Issue , 1996, Pages 364-368

  Papageorgopoulos, Aris ^a   Kamaratos, M ^a,b  

^a CLARK ATLANTA UNIVERSITY   (United States)

^b UNIVERSITY OF IOANNINA   (Greece)

Author keywords

Adsorption kinetics; Atom solid interactions, scattering, diffraction; Auger electron spectroscopy; Chemisorption; Low energy electron diffraction (LEED); Low index single crystal surfaces; Semiconducting surfaces; Silicon; Sulphides; Surface electronic

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; CHEMISORPTION; ELECTRONS; LOW ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SUBSTRATES; SULFUR; SURFACE TREATMENT; SURFACES;

ADSORPTION KINETICS; ATOM SOLID INTERACTIONS; LOW INDEX SINGLE CRYSTAL SURFACES; SEMICONDUCTING SURFACES; SULPHIDES; SURFACE ELECTRONIC PHENOMENA; SURFACE RESTORATION; THERMAL DESORPTION SPECTROSCOPY; WORK FUNCTION MEASUREMENTS;

SILICON;

EID: 0030145009     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01161-7     Document Type: Article

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