Induced magnetic anisotropy in Co-TM-Zr(TM=Nb, Ta, Mo, W, and Ni) amorphous sputtered films

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 60, Issue 5, 1996, Pages 529-536

  Otomo, Shigekazu ^a  

^a HITACHI LTD   (Japan)

Author keywords

Activation energy; Anisotropy field; Cobalt based amorphous sputtered film; Composition dependence; Induced anisotropy; Permeability; Preannealing; Relaxation time; Saturation magnetic flux density

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS ALLOYS; AMORPHOUS FILMS; ANNEALING; COMPOSITION EFFECTS; MAGNETIC ANISOTROPY; MAGNETIC MOMENTS; MAGNETIC PERMEABILITY; MAGNETIC RELAXATION; SPUTTERING;

PREANNEALING; RELAXATION TIME; SATURATION MAGNETIC FLUX DENSITY;

COBALT ALLOYS;

EID: 0030144671     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.60.5_529     Document Type: Article

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