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Volumn 60, Issue 5, 1996, Pages 529-536
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Induced magnetic anisotropy in Co-TM-Zr(TM=Nb, Ta, Mo, W, and Ni) amorphous sputtered films
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HITACHI LTD
(Japan)
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Author keywords
Activation energy; Anisotropy field; Cobalt based amorphous sputtered film; Composition dependence; Induced anisotropy; Permeability; Preannealing; Relaxation time; Saturation magnetic flux density
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Indexed keywords
ACTIVATION ENERGY;
AMORPHOUS ALLOYS;
AMORPHOUS FILMS;
ANNEALING;
COMPOSITION EFFECTS;
MAGNETIC ANISOTROPY;
MAGNETIC MOMENTS;
MAGNETIC PERMEABILITY;
MAGNETIC RELAXATION;
SPUTTERING;
PREANNEALING;
RELAXATION TIME;
SATURATION MAGNETIC FLUX DENSITY;
COBALT ALLOYS;
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EID: 0030144671
PISSN: 00214876
EISSN: None
Source Type: Journal
DOI: 10.2320/jinstmet1952.60.5_529 Document Type: Article |
Times cited : (4)
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References (32)
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