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Volumn 60, Issue 5, 1996, Pages 529-536

Induced magnetic anisotropy in Co-TM-Zr(TM=Nb, Ta, Mo, W, and Ni) amorphous sputtered films

Author keywords

Activation energy; Anisotropy field; Cobalt based amorphous sputtered film; Composition dependence; Induced anisotropy; Permeability; Preannealing; Relaxation time; Saturation magnetic flux density

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS ALLOYS; AMORPHOUS FILMS; ANNEALING; COMPOSITION EFFECTS; MAGNETIC ANISOTROPY; MAGNETIC MOMENTS; MAGNETIC PERMEABILITY; MAGNETIC RELAXATION; SPUTTERING;

EID: 0030144671     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.60.5_529     Document Type: Article
Times cited : (4)

References (32)
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    • Japanese source
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    • 0003277795 scopus 로고
    • Ed. by G. T. Rado and H. Suhl, Academic Press, New York
    • J. C. Slonczewski: Magnetism, vol. 1, Ed. by G. T. Rado and H. Suhl, Academic Press, New York, (1963), 205.
    • (1963) Magnetism , vol.1 , pp. 205
    • Slonczewski, J.C.1
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    • 85033814934 scopus 로고    scopus 로고
    • Japanese source
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    • Japanese source
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    • Japanese source


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.