The As/Si(111) surface studied by angle scanned low energy photoelectron diffraction

Surface Science

Volumn 352-354, Issue , 1996, Pages 332-336

  Gunnella, R ^a   Bullock, E L ^b   Natoli, C R ^c   Ubrberg, R I G ^d   Johansson, L S O ^e  

^a UNIVERSITY OF CAMERINO   (Italy)

^b UNIVERSITY OF LAUSANNE   (Switzerland)

^c INFN LABORATORI NAZIONALI DI FRASCATI   (Italy)

^d LINKÖPING INSTITUTE OF TECHNOLOGY   (Sweden)

^e LUND UNIVERSITY   (Sweden)

Author keywords

Adatoms; Angle resolved photoemission; Electron solid interactions, scattering, diffusion; Photoelectron spectroscopy; Soft X ray photoelectron spectroscopy; Surface relaxation and reconstruction

Indexed keywords

ATOMS; DIFFUSION IN SOLIDS; ELECTRON EMISSION; ELECTRONS; LOW ENERGY ELECTRON DIFFRACTION; RELAXATION PROCESSES; SILICON; SURFACE TREATMENT; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

ADATOMS; ANGLE RESOLVED PHOTOEMISSION; ANGLE SCANNED LOW ENERGY PHOTOELECTRON DIFFRACTION; ELECTRON SOLID INTERACTIONS; SURFACE RECONSTRUCTION; SURFACE RELAXATION;

ARSENIC COMPOUNDS;

EID: 0030144506     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01327-X     Document Type: Article

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