SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 277, Issue 1-2, 1996, Pages 155-161

On some important care to take when making spectrophotometric measurements on semiconductor thin films

(2) Laaziz, Y a Bennouna, A a

a FACULTÉ DES SCIENCES SEMLALIA (Morocco)

Author keywords

Optical properties; Semiconductors; Sputtering; Surface defects

Indexed keywords

ABSORPTION; AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTAL DEFECTS; MATHEMATICAL MODELS; SPECTROPHOTOMETERS; SPECTROPHOTOMETRY; SPUTTERING; THIN FILMS; TRANSPARENCY;

FILM THICKNESS; INTERFERENCE SPECTRAL FRINGES; OPTICAL CONSTANTS; SEMICONDUCTOR THIN FILMS; SURFACE DEFECTS; THICK AMORPHOUS SILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0030143520 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(95)08004-X Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.