Ar/H2 sputtering deposition of 350 μm thick Si:H/SiO2-x:H multilayers having flat interfaces for optical applications

Thin Solid Films

Volumn 277, Issue 1-2, 1996, Pages 132-137

  Takahashi, Hiroki ^a   Nagata, Hirotoshi ^a   Kataoka, Haruki ^a  

^a SUMITOMO OSAKA CEMENT CO LTD   (Japan)

Author keywords

Amorphous materials; Interfaces; Optical coatings; Stress

Indexed keywords

AMORPHOUS SILICON; ARGON; HYDROGEN; INTERFACES (MATERIALS); LIGHT PROPAGATION; MIXTURES; MULTILAYERS; OPTICAL DEVICES; SILICA; SPUTTER DEPOSITION; STRESSES; SURFACE ROUGHNESS;

ABSORPTION LOSSES; FLAT INTERFACES; GAS MIXTURES; INTERNAL STRESS; OPTICAL APPLICATIONS; OPTICAL PROPAGATION LOSSES; THICK MULTILAYERS;

THICK FILMS;

EID: 0030143519     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08016-3     Document Type: Article

References (23)

1. S. Kawakami, Appl. Opt., 22 (1983) 2426.
2. K. Shiraishi and S. Kawakami, Opt. Lett., 15 (1990) 516; S. Sato, K. Shiraisi, K. Tsuchida and S. Kawakami, Appl. Phys. Lett., 61 (1992) 2633.
3. K. Shiraishi and S. Kawakami, Opt. Lett., 15 (1990) 516; S. Sato, K. Shiraisi, K. Tsuchida and S. Kawakami, Appl. Phys. Lett., 61 (1992) 2633.
4. T. Yanagimachi, H. Oguri, J. Nayyer, S. Ishihara and J. Minowa, Appl. Opt., 33 (1994) 3513.
5. K.H. Guenther, Appl. Opt., 20 (1981) 1034.
6. A.M. Ledger, Appl. Opt., 18 (1979) 2979.
7. J.W. Patten, Thin Solid Films, 63 (1979) 121.
8. K.H. Guenther, Appl. Opt., 23 (1984) 3806.
9. T. Sato, T. Sasaki, K. Tsuchida, K. Shiraishi and S. Kawakami, Appl. Opt., 33 (1994) 6925.
10. A. Gallagher, J. Appl. Phys., 63 (1988) 2406.
11. L.M. Mack and A. Reisman, J. Electrochem. Soc., 136 (1989).
12. For example, R. Messier, T. Takamori and R. Roy, J. Vac. Sci. Technol., 13 (1976) 1060; D.W. Hoffman and J.A. Thornton, J. Vac. Sci. Technol., 20 (1982) 355.
13. For example, R. Messier, T. Takamori and R. Roy, J. Vac. Sci. Technol., 13 (1976) 1060; D.W. Hoffman and J.A. Thornton, J. Vac. Sci. Technol., 20 (1982) 355.
14. J.P. Habison, A.J. Willams and D.V. Lang, J. Appl. Phys., 55 (1984) 946; J.C.G. de Sacde, C.N. Afonso, J.L. Escudero, R. Serna, F. Catalina and E. Bernabeu, Appl. Opt., 31 (1992) 6133.
15. J.P. Habison, A.J. Willams and D.V. Lang, J. Appl. Phys., 55 (1984) 946; J.C.G. de Sacde, C.N. Afonso, J.L. Escudero, R. Serna, F. Catalina and E. Bernabeu, Appl. Opt., 31 (1992) 6133.
16. S. Yoshida, Hakumaku (Thin Films), Chapt. 5, Baifukan, Tokyo, 1990 (in Japanese).
17. S. Yamasaki, H. Hata, T. Yosida, H. Oheda, A. Matsuda, H. Okushi and K. Tanaka, J. Phys., 42 (1981) 297.
18. J.C. Knights, Jpn. J. Appl. Phys., 19 (1980) 521.
19. J.C. Knights, J. Non-Cryst. Solids, 35/36 (1980) 159.
20. S. Iizima, H. Okushi, A. Matsuda, S. Yamasaki, K. Nakagawa, M. Mitsumura and K. Tanaka, Jpn. J. Appl. Phys., 19 (1980) 521.
21. G. Ganguly and A. Matsuda, Phys. Rev. B, 7 (1993) 3661.
22. H. Takahashi, H. Nagata, H. Kataoka and H. Takai, J. Appl. Phys., 75 (1994) 2667.
23. H. Yokota, H. Ikeda and K. Ishiguro, in S. Fujiwara (ed.), Kougaku-Hakumaku (Optical Thin Films), Chapt. 3, Kyouritsu, Tokyo, 1986 (in Japanese).