Using an enclosed process chamber for FPD chemical cleaning

MICRO

Volumn 14, Issue 5, 1996, Pages 43-47

  Walter, Alan E ^a,d   Paczewski, Richard M ^a,e   Parker, Jennifer W ^a   Chiang, Anne ^b,f,g,h,i,j   Donigan, Maria S ^b   Shih, Andrew H ^c  

^a CFM Technologies

^b dpiX ^*

^c PALO ALTO RESEARCH CENTER   (United States)

^d CFM Technologies   (United States)

^e UNIVERSITY OF PENNSYLVANIA   (United States)

^f dpiX LLC   (United States)

^g NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^h UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

ⁱ IEEE

^j Society for Information Display

more..

Author keywords

[No Author keywords available]

Indexed keywords

DISPLAY DEVICES; DRYING; MATERIALS HANDLING EQUIPMENT; PARTICLES (PARTICULATE MATTER); REMOVAL; SOLUTIONS;

ENCLOSED PROCESS CHAMBER; FLAT PANEL DISPLAYS; INTEGRATED CLEANING SYSTEM; PARTICLE REMOVAL EFFICIENCY; PRODUCTION LINE;

CHEMICAL CLEANING;

EID: 0030143209     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. O'Mara WC, "Active Matrix Liquid Crystal Displays, Part II: Markets," Solid State Technology, Flat Panel Display Reprint Series, pp 8-11, 1994.
2. DeLiso EM, Ryszytiwskyj WP, Foster GF, et al., "The Impact on Cleaning of Surface Interactions between LCD Flat-Panel-Display Glass and Detergents," in Society for Information Display International Symposium Digest of Technical Papers, vol XXV, Santa Ana, CA, SID, pp 854-858, 1994.
3. Walter AE, and Parker JW, "Effective Precision Cleaning of Flat-Panel Displays," in Society for Information Display International Symposium Digest of Technical Papers, vol XXV, Santa Ana, CA, SID, pp 947-950, 1994.
4. Michaels LD, Menon VB, Donovan RP, et al., "An Experimental Study of Particle Deposition and Removal at the Air-Liquid-Wafer Interface," in Proceedings of the 1988 Microcontamination Conference, Santa Monica, CA, Canon Communications, pp 184-195, 1988.
5. Riley DJ, and Carbonell RG, "The Deposition of Contaminants from Deionized Water onto Hydrophobic Silicon Wafers," Journal of the IES, November-December, pp 28-34, 1991.
6. McConnell CF, "Examining the Effects of Wafer Surface Chemistry on Particle Removal Using Direct-Displacement Isopropyl Alcohol Drying," Microcontamination, 9(2):35-40, 1991.