Thermodynamics of the Si-O-N system: I. High-temperature study of the vaporization behavior of silicon nitride by mass spectrometry

Journal of the American Ceramic Society

Volumn 79, Issue 5, 1996, Pages 1351-1360

  Rocabois, Ph ^a   Chatillon, Ch ^a   Bernard, C ^a  

^a UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ENTHALPY; HIGH TEMPERATURE PROPERTIES; MASS SPECTROMETRY; SILICON COMPOUNDS; THERMODYNAMIC PROPERTIES; VAPORIZATION;

EFFUSION CELLS;

SILICON NITRIDE;

EID: 0030143018     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1996.tb08596.x     Document Type: Article

References (41)

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