Durability of dielectric protective layers against repetitious thermal stress in phase-change optical recording

Thin Solid Films

Volumn 278, Issue 1-2, 1996, Pages 74-81

  Horie, M ^a   Ohno, T ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

Dielectric properties; Optical recording; Protective films; Thermal stress

Indexed keywords

CRACK PROPAGATION; DURABILITY; OPTICAL FILMS; OPTICAL RECORDING; PLASTIC DEFORMATION; PROTECTIVE COATINGS; SILICA; SILICON NITRIDE; TANTALUM COMPOUNDS; THERMAL STRESS; THIN FILMS; ZINC SULFIDE;

BULK DENSITY; REPETITIOUS OVERWRITING; TANTALUM OXIDES; VOID FORMATION;

DIELECTRIC FILMS;

EID: 0030142574     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08184-4     Document Type: Article

References (27)

1. J. Feinleib, J. de Neufville, S.C. Moss and S.R. Ovshinsky, Appl. Phys. Lett., 18 (1971) 254.
2. M. Chen, K.A. Rubin and R.W. Barton, Appl. Phys. Lett., 49 (1986) 502.
3. M. Chen, K.A. Rubin, V. Marrello, U.G. Gerber and V.B. Jibson, Appl. Phys. Lett., 46 (1985) 734.
4. R.T. Young, D. Strand, J. Gonzalez-Hernandez and S.R. Ovshinsky, J. Appl. Phys., 60 (1986) 4319.
5. N. Yamada, E. Ohno, K. Nishiuchiand N. Akahira, Jpn. J. Appl. Phys., 26 (suppl. 26-4) (1987) 61.
6. K. Nishimura, M. Suzuki, I. Morimoto and K. Mori, Jpn. J. Appl. Phys., 28 (suppl. 28-3) (1989) 135.
7. N. Yamada, E. Ohno, K. Nishiuchi and N. Akahira, J. Appl. Phys., 69 (1991) 2849.
8. T. Ohta, M. Uchida, K. Yoshida, S. Furukawa and K. Kotera, Proc. Soc. Photo-Opt. Instrum. Eng., 1028 (1989) 27.
9. K.A. Rubin, D.P. Birnie III and M. Chen, J. Appl. Phys., 71 (1992) 3680.
10. K. Nagata, E. Ohno and N. Yamada, Abstract of the 3rd Symp. on Phase Change Optical Recording Technol., 1991, p. 14.
11. T. Ohta, K. Yoshioka, T. Akakira and K. Kawahara, Abstract of the 2nd Symp. on Phase Change Optical Recording Technol., 1991, p. 60.
12. S. Okamine, S. Hirasawa, M. Teraoand Y. Miyauchi, Proc. Soc. Photo-Opt. Inst. Eng., 1663 (1992) 315.
13. K.E. Evans, M.A. Nkansah and S.J. Abott, J. Appl. Phys., 64 (1988) 3398.
14. S. Okamine, Y. Miyauchi, M. Terao and K. Ando, Tech. Rep. Jpn. IEICE., CPM90-36, 49 (1990).
15. M. Horie, Y. Tanaka and M. Ishida, Mitsubishi Kasei R and D Rev., 4 (2) (1990) 68.
16. JIS, Z2251-1980.
17. J.A. Thornton, J. Vac. Sci. Technol., A4 (1986) 3059 and references cited in this review article.
18. J.M.E. Harper, Plasma-Surface Interactions and Processing of Materials, Kluwer, Dordrecht, 1990, p. 251.
19. Y. Seta, K. Sano and Y. Yamaguchi, Mitsubishi Kasei R and D Rev., 3 (1) (1989) 30.
20. D.M. Mattox, J. Vac. Sci. Technol., A7 (1989) 1105.
21. Y. Yamazaki, K. Horiuchi, Y. Kudo and I. Hatakeyama, Proc. 52nd Autumn Meet. of Jpn. Soc. Appl. Phys., 1991, p. 1048.
22. M. Horie, T. Ohno, K. Uchino and H. Yoshida, Mitsubishi Kasei R and D Rev., 5 (2) (1991) 49.
23. T. Ohno and M. Horie, Abstract of the 6th Symp. on Phase Change Optical Recording Technol., 1994, p. 82.
24. S. van der Zwaag, J.T. Hagan and I.E. Field, J. Mater. Sci., 15 (1980) 2965.
25. I.W. Donald, J. Mater. Sci., 24 (1989) 4177.
26. R.W. Rice, J. Mater. Sci. Lett., 13 (1944) 1408.
27. M. Horie, T. Ohno, K. Uchino and H. Yoshida, Abstract of the 3rd Symp. on Phase Change Optical Recording Technol., 1991, p. 7.