Negative ion formation from SiCl4 adsorbed on Si(100)

Surface Science

Volumn 352-354, Issue , 1996, Pages 327-331

  Guo, Q ^a   Sterratt, D ^a   Williams, E M ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Electron stimulated desorption (ESD); Physical adsorption; Silicon

Indexed keywords

ADSORPTION; CHARGE TRANSFER; CHLORINE; DESORPTION; IONS; MONOLAYERS; SILICON COMPOUNDS; SURFACES;

ELECTRON STIMULATED DESORPTION; ION YIELD PEAKS; NEGATIVE ION FORMATION; SILICON TETRACHLORIDE;

SILICON;

EID: 0030141834     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01155-2     Document Type: Article

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