The structure of Co films on Cu(111) up to 15 ML

Surface Science

Volumn 352-354, Issue , 1996, Pages 46-49

  Muller S ^a   Kostka, G ^a   Schafer T ^a   De La Figuera, J ^b   Prieto, J E ^b   Ocal, C ^b   Miranda, R ^b   Heinz, K ^a   Muller K ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Cobalt; Copper; Low energy electron diffraction (LEED); Metallic films; Scanning tunneling microscopy; Surface tension

Indexed keywords

COBALT; COPPER; CRYSTAL LATTICES; DIFFUSION; EPITAXIAL GROWTH; GROWTH KINETICS; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; STACKING FAULTS; SURFACE STRUCTURE; SURFACE TENSION;

COBALT FILMS; IDEAL LATTICE PARAMETER; PSEUDOMORPHIC; PURE STACKING; TOP COPPER LAYER;

METALLIC FILMS;

EID: 0030141832     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01088-2     Document Type: Article

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