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Volumn 352-354, Issue , 1996, Pages 641-645

Origin of rippled structures formed during growth of Si on Si(001) with MBE

Author keywords

Atomic force microscopy; Epitaxy; Faceting; Growth; Models of surface kinetics; Molecular beam epitaxy; Non equilibrium thermodynamics and statistical mechanics; Silicon; Single crystal epitaxy; Stepped single crystal surfaces; Surface structure, morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; OPTICAL MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; STATISTICAL MECHANICS; SURFACE ROUGHNESS; THERMODYNAMICS; X RAY CRYSTALLOGRAPHY;

EID: 0030141694     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01219-2     Document Type: Article
Times cited : (9)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.