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Volumn 352-354, Issue , 1996, Pages 641-645
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Origin of rippled structures formed during growth of Si on Si(001) with MBE
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Author keywords
Atomic force microscopy; Epitaxy; Faceting; Growth; Models of surface kinetics; Molecular beam epitaxy; Non equilibrium thermodynamics and statistical mechanics; Silicon; Single crystal epitaxy; Stepped single crystal surfaces; Surface structure, morphology
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
MATHEMATICAL MODELS;
MOLECULAR BEAM EPITAXY;
MORPHOLOGY;
OPTICAL MICROSCOPY;
SEMICONDUCTING SILICON;
SEMICONDUCTOR GROWTH;
SINGLE CRYSTALS;
STATISTICAL MECHANICS;
SURFACE ROUGHNESS;
THERMODYNAMICS;
X RAY CRYSTALLOGRAPHY;
FACETING;
KINK BUNCHING;
MICROSCOPIC MECHANISM YIELDING DEVIATIONS;
NON EQUILIBRIUM THERMODYNAMICS;
RIPPLED STRUCTURE;
SINGLE CRYSTAL EPITAXY;
STEPPED SINGLE CRYSTAL SURFACES;
SURFACE KINETICS;
TOPOGRAPHY;
SURFACE STRUCTURE;
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EID: 0030141694
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(95)01219-2 Document Type: Article |
Times cited : (9)
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References (6)
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