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Surface Science

Volumn 352-354, Issue , 1996, Pages 612-616

In situ characterization of SiO2 etching with second harmonic generation and ellipsometry

(4) Priem, A a Van Hasselt, C W a Devillers, M A C a Rasing, Th a

a RADBOUD UNIVERSITY NIJMEGEN (Netherlands)

Author keywords

Crystalline amorphous interfaces; Ellipsometry; Etching; Second harmonic generation; Silicon oxides

Indexed keywords

AMORPHOUS MATERIALS; CHARACTERIZATION; CRYSTALLINE MATERIALS; ELLIPSOMETRY; ETCHING; IN SITU PROCESSING; INTERFACES (MATERIALS); LIGHT REFLECTION; MATHEMATICAL MODELS; SECOND HARMONIC GENERATION;

LINEAR OPTICAL MEASUREMENTS; LINEAR REFLECTIVITY;

SILICA;

EID: 0030141259 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/0039-6028(95)01213-3 Document Type: Article

Times cited : (4)

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