Hydrogen content in boron thin films prepared by ECR discharge of decaborane diluted by hydrogen and helium gases

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 305-310

  Ito, Yoshifumi ^a   Arakawa, Takashi ^a   Nishikawa, Masahiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; HELIUM; HYDROGEN; ION BOMBARDMENT; PLASMA APPLICATIONS; SPECTROSCOPY; THIN FILMS;

ELECTRON CYCLOTRON RESONANCE (ECR) DISCHARGES; PLASMA CHEMICAL VAPOR DEPOSITION (PCVD);

PLASMA SOURCES;

EID: 0030134699     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/028     Document Type: Article

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