A large-area ECR processing plasma

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 265-267

  Miyazawa, Wataru ^a   Tada, Shigekazu ^a   Ito, Kohichi ^a   Saito, Hironori ^b   Den, Shoji ^b   Hayashi, Yuzo ^b   Okamoto, Yukio ^c   Sakamoto, Yuichi ^a  

^a Nichimen Electronic Technology Corp   (Japan)

^b Irie Koken Co Ltd   (Japan)

^c TOYO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC FIELDS; ELECTRON CYCLOTRON RESONANCE; MAGNETIC FIELD EFFECTS; MICROWAVE ANTENNAS; OXYGEN; PERMANENT MAGNETS; PLASMA DENSITY;

ELECTRON CYCLOTRON RESONANCE PLASMAS; PLASMA ELECTRON DENSITY; PLASMA ELECTRON TEMPERATURE;

PLASMA SOURCES;

EID: 0030134637     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/021     Document Type: Article

References (8)

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3. Sato N, Iizuka S, Nakagawa Y and Tsukada T 1993 Appl. Phys. Lett. 62 1469
4. Iizuka S and Sato N 1994 Japan. J. Appl. Phys. 33 4221
5. Hiyama S, Ono T, Nakagawa Y, Tanaka A, Iizuka S and Sato N 1995 Proc. 12th Symp. on Plasma Processing, Sendai (Division of Plasma Electronics, the Japan Society of Applied Physics) p 237
6. Ogle J S 1995 USA patent 4 948 458
7. Chen F F 1991 Plasma Phys. Controlled Fusion 33 339
8. Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p 27