The K+-C60- plasma for material processing

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 288-292

  Hirata, T ^a   Hatakeyama, R ^a   Mieno, T ^b   Iizuka, S ^a   Sato, N ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; FILM PREPARATION; FULLERENES; IONS; MAGNETIC FIELD EFFECTS; PLASMA CONFINEMENT; THIN FILMS;

MAGNETICALLY CONFINED PLASMAS; ULTRAFINE PARTICLE PLASMAS;

PLASMA SOURCES;

EID: 0030134566     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/025     Document Type: Article

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