A large-diameter uniform plasma produced by a plane slotted ECR antenna

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 293-298

  Ono, Takashi ^a   Hiyama, Shin ^b   Nakagawa, Yukito ^c   Lizuka, Satoru ^a   Sato, Noriyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b HITACHI KOKUSAI ELECTRIC INC   (Japan)

^c Anelva Corporation ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; MAGNETIC FIELD EFFECTS; MICROWAVE ANTENNAS; PERMANENT MAGNETS; PLASMA DENSITY; SLOT ANTENNAS; WAVE PLASMA INTERACTIONS;

ELECTRON CYCLOTRON RESONANCE (ECR) ANTENNAS; PLASMA ELECTRON DENSITY; PLASMA ELECTRON TEMPERATURE;

PLASMA SOURCES;

EID: 0030133958     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/026     Document Type: Article

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