Determination of the height of a microstructure sample by a SEM with a conventional and a digital photogrammetric method

Ultramicroscopy

Volumn 63, Issue 1, 1996, Pages 57-64

  Schubert, M ^a   Gleichmann, A ^a   Hemmleb, M ^b   Albertz, J ^b   Kohler J M ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; MATHEMATICAL MODELS; MICROSTRUCTURE; PHOTOGRAMMETRY; SURFACE STRUCTURE;

DIGITAL PHOTOGRAMMETRY; NANOMARKER TECHNIQUE; TOPOGRAPHY;

SCANNING ELECTRON MICROSCOPY;

ARTICLE; MEASUREMENT; METHODOLOGY; SCANNING ELECTRON MICROSCOPY;

EID: 0030130416     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-3991(96)00028-9     Document Type: Article

References (11)

1. [1] G.S. Pingali and R. Jain, in: IEEE Workshop on Applications of Computer Vision, Los Alamitos, USA (IEEE Comput. Soc. Press, 1992) p. 282.
2. [2] E.W. Becker, W. Ehrfeld, P. Hagmann, A. Maner and D. Münchmeyer, KfK-Report 3995 (Kernforschungszentrum Karlsruhe, 1985).
3. [3] SENSOR Magazin 4 (1994) p. 26, [from: LZH Aktuell, Ausgabe 8, April 94, Laser Zentrum Hannover e.V.].
4. [4] H. Sato, in: Proc. of Manufacturing International '90, Vol.3, Eds. E. Fisher et al. (ASME, New York, 1990) p. 63.
5. [5] A. Boyde and H.S. Ross, Photogrammetric Record 46 (1975) p. 408.
6. [6] T. Suganuma, J. Electron Microsc. 34 (1985) 328.
7. [7] V.V. Kazmiruk and I.S. Stepanov, Scanning 15 (1993) 161.
8. [8] W. Beil and I.C. Carlsen, J. Microsc. 157 (1990) 127.
9. [9] K.T. Kohlmann-von Platen, J. Chlebek, M. Weiss, K. Reimer, H. Oertel and W.H. Brünger, J. Vac. Sci. Technol. 11 (1993) 2219.
10. [10] A. Gleichmann, J.M. Köhler, M. Hemmleb and J. Albertz, SPIE 2184 (Three-Dimensional Microscopy) p. 254.
11. [11] M. Hemmleb, J. Albertz, M. Schubert, A. Gleichmann and J.M. Köhler, Beiträge zur Elektronenmikroskopischen Direktabbildung und Analyse von Oberflächen (BEDO) 28 (1995) 65.