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Volumn 11, Issue 4, 1996, Pages 601-606
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Simultaneous changes in the photoluminescence, infrared absorption and morphology of porous silicon during etching by HF
a a a a a b b |
Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION;
ETCHING;
HYDROFLUORIC ACID;
HYDROGEN;
INFRARED RADIATION;
MORPHOLOGY;
OXYGEN;
PASSIVATION;
POROUS SILICON;
SCANNING ELECTRON MICROSCOPY;
WATER;
CHEMICAL TREATMENT;
CHEMISORPTION DESORPTION PROCESSES;
ELECTROCHEMICAL ETCHING;
EXCITATION WAVELENGTH;
INFRARED ABSORPTION;
MORPHOLOGICAL SURFACE MODIFICATION;
PHOTOLUMINESCENCE MEASUREMENT;
POROUS SILICON LAYERS;
PHOTOLUMINESCENCE;
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EID: 0030129796
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/11/4/024 Document Type: Article |
Times cited : (20)
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References (23)
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