Two-dimensional sheath evolution in a negative ion plasma

Journal of Applied Physics

Volumn 79, Issue 8 pt 1, 1996, Pages 3853-3860

  El Zein, Yasser ^a   Amin, Ali ^a   Shen, Chonghui ^a   Yi, Seungjun ^a   Lonngren, Karl E ^a   Sheridan, Terrence E ^a  

^a UNIVERSITY OF IOWA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRODES; ION IMPLANTATION; IONS; MATHEMATICAL MODELS; NONLINEAR EQUATIONS; PLASMA DENSITY;

EXCITATION VOLTAGE; ION FLUX DENSITY; PLASMA SOURCE ION IMPLANTATION; SHEATH EXPANSION; TWO DIMENSIONAL;

PLASMA SHEATHS;

EID: 0030129637     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361803     Document Type: Article

References (30)