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Volumn 21, Issue 4, 1996, Pages 281-291

Hydrogen diffusion and solubility in palladium thin films

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DIFFUSION; ELECTROCHEMISTRY; HYDROGEN; METALLIC FILMS; PALLADIUM; SOLID SOLUTIONS; SOLUBILITY; STRIPPING (REMOVAL); VAPOR DEPOSITION;

EID: 0030129393     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/0360-3199(95)00094-1     Document Type: Article
Times cited : (70)

References (19)
  • 17
    • 0001683466 scopus 로고
    • G. Alefeld and J. Völkl (eds), Springer, New York
    • J. Vollcl and G. Alefeld, in G. Alefeld and J. Völkl (eds), p. 321. Hydrogen in Metals I, Springer, New York (1978).
    • (1978) Hydrogen in Metals I , pp. 321
    • Vollcl, J.1    Alefeld, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.