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Volumn 98, Issue 4, 1996, Pages 273-277
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Visible photoluminescence from low temperature deposited hydrogenated amorphous silicon nitride
a a a |
Author keywords
A. thin films; D. optical properties; E. luminescence
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Indexed keywords
AMMONIA;
AMORPHOUS MATERIALS;
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HYDROGENATION;
OPTICAL PROPERTIES;
PHOTOLUMINESCENCE;
PLASMA APPLICATIONS;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
HYDROGENATED AMORPHOUS SILICON NITRIDE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAPID THERMAL PROCESSOR;
VALANCY;
SILICON NITRIDE;
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EID: 0030127783
PISSN: 00381098
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1098(96)00064-6 Document Type: Article |
Times cited : (43)
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References (19)
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