A universal ion-beam-sputtering device for diffusion studies

Measurement Science and Technology

Volumn 7, Issue 4, 1996, Pages 632-640

  Wenwer, Friedrich ^a   Gude, Anja ^a   Rummel, Gerhard ^a   Eggersmann, Martin ^a   Zumkley, Thomas ^a   Stolwijk, Nicolaas A ^a   Mehrer, Helmut ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; DIFFUSION IN SOLIDS; INTERMETALLICS; ION BEAMS; METALLIC GLASS; METALS; SEMICONDUCTOR MATERIALS; TRACE ELEMENTS;

ION BEAM SPUTTERING; ION MILLING; RADIOTRACER DIFFUSION;

SPUTTERING;

EID: 0030127782     PISSN: 09570233     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-0233/7/4/021     Document Type: Article

References (23)

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