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Applied Physics Letters

Volumn 68, Issue 14, 1996, Pages 1898-1900

Kinetics of thermal oxidation of AlAs in water vapor

(5) Ochiai, M a Giudice, G E a Temkin, H a Scott, J W b Cockerill, T M b

a Engineering Research Center and Hydraulics Laboratory (United States)

b Vixel Corporation (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DIFFERENTIAL EQUATIONS; DIFFUSION; FILM GROWTH; LOW TEMPERATURE OPERATIONS; MATHEMATICAL MODELS; OXIDATION; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR LASERS; VAPORS; WATER;

ALUMINUM ARSENIDE; RATE CONTROLLING MECHANISMS; RATE EQUATIONS; VERTICAL CAVITY SURFACE EMITTING LASERS; WATER VAPOR;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0030127779 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.116287 Document Type: Article

Times cited : (55)

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