Influence of bubble adherence on the kinetics of the fluorine evolution process

Electrochimica Acta

Volumn 41, Issue 6, 1996, Pages 911-918

  Nicolas, F ^a   Groult, H ^b   Devilliers, D ^b   Chemla, M ^b  

^a Service RandD   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Anodic transfer coefficient; Carbon; Fluorine; Impedance; KF 2HF

Indexed keywords

ACTIVATED CARBON; ANODES; BUBBLES (IN FLUIDS); CARBON; CURRENT DENSITY; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; FLUORINE; INTERFACIAL ENERGY; REACTION KINETICS;

ANODIC TRANSFER COEFFICIENT; BUBBLE ADHERENCE; CARBON ANODES; FLUORINE EVOLUTION PROCESS;

ELECTROLYSIS;

EID: 0030126324     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/0013-4686(95)00385-1     Document Type: Article

References (25)

1. A. J. Rudge, Industrial Electrochemical Processes (Edited by A. T. Kuhn), Chap. 1. Elsevier, Amsterdam (1971).
2. L. Bai and B. E. Conway, J. appl. Electrochem. 18, 839 (1988).
3. M. Chemla and D. Devilliers, J. electrochem. Soc. 136, 87 (1989).
4. M. Jaccaud, R. Faron, D. Devilliers and R. Romano, in Ullmann's Encyclopedia of Industrial Chemistry, Vol. A11, p. 293. VCH, Weinheim (1988).
5. H. Imoto, T. Nakajima and N. Watanabe, Bull. chem. Soc. Jpn. 48, 1633 (1975).
6. D. Devilliers, M. Vogler, F. Lantelme and M. Chemla, Anal. Chim. Acta 153, 69 (1983).
7. M. Chemla, D. Devilliers and F. Lantelme, Anal. Chim. Fr. 9, 633 (1984).
8. L. Bai and B. E. Conway, J. appl. Electrochem. 20, 925 (1990).
9. H. Groult, D. Devilliers, M. Vogler, C. Hinnen, P. Marcus and F. Nicolas, Electrochim. Acta 38, 2413 (1993).
10. D. Devilliers, F. Lantelme and M. Chemla, J. Chim. Phys. 76, 428 (1979).
11. H. Gerischer, in Physical Chemistry (Edited by H. Eyring), Vol. IX A, Chap. 5. Academic Press, New York (1970).
12. H. Groult, D. Devilliers, M. Vogler and M. Chemla, J. appl. Electrochem. 24, 870 (1994).
13. H. Groult, Thesis, Paris (1992).
14. D. Devilliers, M. Chemla, H. Groult and I. Okada, Denki Kagaku 60, 438 (1992).
15. D. Devilliers, H. Groult, O. Kerrec and M. Chemla, in Molten Salt Chemistry and Technology, Materials Science Forum (Edited by M. Chemla and D. Devilliers), Vol. 73-75, p. 373, Zürich (1991).
16. C. J. Brugg, A. L. G. Van Den Eeden, M. Sluyters-Rehbach and J. H. Sluyters, J. electroanal. Chem. 176, 275 (1984).
17. J. R. Macdonald and D. R. Franceschetti, in Impedance Spectroscopy (Edited by J. R. Macdonald), p. 84. Wiley, New York (1987).
18. N. Watanabe, T. Nakajima and H. Touhara, in Graphite Fluorides, Chap. 1, p. 5. Elsevier, Amsterdam (1988).
19. O. R. Brown, B. M. Ikeda and M. J. Wilmott, Electrochim. Acta 32, 1163 (1987).
20. M. Okido, J. K. Depo and G. A. Capuano, J. electrochem. Soc. 140, 127 (1993).
21. G. Kortüm and J. O' M. Bockris, Textbook of Electrochemistry, Vol. II. Elsevier, Amsterdam (1951).
22. Asahi Glass Co., JP-Kokai Patent 58 81 981 (1983).
23. T. Tojo, J. Hiraiwa, M. Dohi and Y. Chong, J. Fluorine Chem. 57, 93 (1992).
24. D. Devilliers, B. Teisseyre, M. Vogler and M. Chemla, J. appl. Electrochem. 20, 91 (1990).
25. P. T. Hough and D. M. Novak-Antoniou, US Patent 4 602 985 (1986).