In situ hydrogenation of visible a-SiC:H-based p-i-n type thin-film light-emitting diodes using the photochemical vapour deposition method

Semiconductor Science and Technology

Volumn 11, Issue 4, 1996, Pages 597-600

  Lee, Jong Wook ^a   Lim, Koeng Su ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELECTROLUMINESCENCE; HYDROGEN; HYDROGENATION; IRRADIATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR JUNCTIONS; SILICON CARBIDE; THIN FILMS;

IN SITU HYDROGENATION; PHOTOCHEMICAL VAPOR DEPOSITION METHOD; SUBSTRATE TEMPERATURE; THIN FILM LIGHT EMITTING DIODES; THRESHOLD VOLTAGE; ULTRAVIOLET LIGHT IRRADIATION;

LIGHT EMITTING DIODES;

EID: 0030125771     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/4/023     Document Type: Article

References (9)

1. Kruangam D, Deguchi D, Toyama T, Okamoto H and Hamakawa Y 1988 IEEE Trans. Electron Devices 35 957
2. Paasche M, Toyama T, Okamoto H and Hamakawa Y 1989 IEEE Trans. Electron Devices 36 2895
3. Jen T S, Pan J W, Shin N F, Tsay W C, Hong J W and Chang C Y 1994 Japan. J. Appl. Phys. 33 827
4. Faùghnan B and Ipri AC 1989 IEEE Trans. Electron Devices 36 101
5. Wu I W, Lewis A G, Huang T Y and Chiang A 1989 IEEE Electron Device Lett. 10 123
6. Veloarisoa I A, Stavola M, Kozuch D M, Peale R E and Watkins G D 1991 Appl. Phys. Lett. 59 2121
7. Lee J W, Hur S H and Lim KS 1995 IEDM '95 p 825
8. Pankove J I 1977 Electroluminescence (Berlin: Springer) p 24
9. Tanaka H, Ishiguro N, Miyashita T, Yanagawa N, Sadamoto M, Koyama M, Miyachi K, Ashida Y and Fukuda N 1993 23rd IEEE Photovoltaic Specialists Conf. Part II, p 811