Role of structure in the interfacial reactions of Bi and Sb

Journal of Magnetism and Magnetic Materials

Volumn 156, Issue 1-3, 1996, Pages 281-282

  Missana, T ^a   Afonso, C N ^a   Petford Long, A K ^a   Doole, R C ^a  

^a CSIC   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; BISMUTH; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; DIFFUSION; EPITAXIAL GROWTH; FILM GROWTH; GRAIN BOUNDARIES; INTERFACES (MATERIALS); MORPHOLOGY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

ANTIMONY BISMUTH BILAYERS; DEPOSITION ORDER; INTERFACIAL REACTIONS; LATTICE CONTROLLED INTERDIFFUSION;

MAGNETIC FILMS;

EID: 0030124584     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-8853(95)00869-1     Document Type: Article

References (4)

1. J. Takahashi T. Miyagawa Jpn. J. Appl. Phys. 31 1992 1110
2. T. Missana; F. Catalina; C.N. Afonso and M.A. Ollacarizqueta, Thin Solid Films, in press.
3. T.M. Christensen D.I. Dalton Surf. Interface Anal. 18 1992 153
4. F. Catalina M.A. Ollacarizqueta C.N. Afonso Phil. Mag. B 71 1995 437