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Volumn 275, Issue 1-2, 1996, Pages 216-219
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Electrodeposition of metallic multilayers with modulated electric regimes
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Author keywords
Deposition process; Magnetic properties and in situ thickness measurements; Metals; Multilayers
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Indexed keywords
CHEMICAL REACTIONS;
COBALT;
COPPER;
ELECTRODEPOSITION;
ELECTROLYTES;
IONS;
MAGNETIC PROPERTIES;
METALLIC FILMS;
MONITORING;
NICKEL;
PHYSICAL PROPERTIES;
REACTION KINETICS;
COBALT FILM;
COPPER FILM;
IN SITU THICKNESS MEASUREMENT;
MAGNETIC SENSORS;
METALLIC MULTILAYERS;
MODULATED ELECTRIC REGIME;
NICKEL FILM;
PULSED POTENTIOSTATIC DEPOSITION;
QUARTZ MICROBALANCE;
MULTILAYERS;
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EID: 0030123806
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(95)07047-8 Document Type: Article |
Times cited : (12)
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References (11)
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