Influence of deposition conditions and ion irradiation on thin films of amorphous Cu-Zr superconductors

Thin Solid Films

Volumn 275, Issue 1-2, 1996, Pages 82-86

  Karpe, N ^a   Bottiger J ^b   Krog, J P ^b   Nordstrom A ^a   Rapp, O ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b AARHUS UNIVERSITY   (Denmark)

Author keywords

Amorphous materials; Deposition process; Ion bombardment; Superconductivity

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ION BOMBARDMENT; IONS; IRRADIATION; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY;

DEPOSITION CONDITION; ELECTRON BEAM CODEPOSITION; HOMOGENEITY; ION BEAM MIXING; ION IRRADIATION; RELATIVE RESISTANCE CHANGE; RESIDUAL RESISTANCE RATIO;

SUPERCONDUCTING FILMS;

EID: 0030123412     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)07025-7     Document Type: Article

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