Giant magnetoresistance in Co/Cu multilayers sputtered with Kr

Journal of Magnetism and Magnetic Materials

Volumn 156, Issue 1-3, 1996, Pages 327-328

  Tsutsumi, K ^a   de Haan, P ^a   Eisenberg, M ^a   Monsma, D ^a   Lodder, J C ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COPPER; CRYSTAL STRUCTURE; KRYPTON; MAGNETIC VARIABLES MEASUREMENT; MAGNETORESISTANCE; MORPHOLOGY; SPUTTER DEPOSITION;

GIANT MAGNETORESISTANCE EFFECT; MAGNETORESISTANCE MEASUREMENTS;

MULTILAYERS;

EID: 0030123058     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-8853(95)00886-1     Document Type: Article

References (2)

1. W.F. Egelhoff Jr. M.T. Kief IEEE Trans. Magn. 28 1992 2724
2. P.J. Grundy R.J. Pollard M.E. Tomlinson J. Magn. Magn. Mater. 126 1993 516