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Volumn 32, Issue 9, 1996, Pages 850-851
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Fully self-aligned Si bipolar transistor with collector and base grown using silane-only selective epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
EPITAXIAL GROWTH;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILANES;
FULLY SELF ALIGNED SILICON BIPOLAR TRANSISTORS;
SILANE ONLY SELECTIVE EPITAXY;
BIPOLAR TRANSISTORS;
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EID: 0030122442
PISSN: 00135194
EISSN: None
Source Type: Journal
DOI: 10.1049/el:19960570 Document Type: Article |
Times cited : (2)
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References (8)
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