Impedance analysis of Si/SiO2 heterostructures grafted with antibodies: An approach for immunosensor development

Journal of Electroanalytical Chemistry

Volumn 406, Issue 1-2, 1996, Pages 53-58

  Maupas, Hubert ^a   Saby, Coralie ^a   Martelet, Claude ^a   Jaffrezic Renault, Nicole ^a   Soldatkin, Alexey P ^b   Charles, Marie Hélène ^c   Delair, Thierry ^c   Mandrand, Bernard ^c  

^a ECOLE CENTRALE DE LYON   (France)

^b INSTITUTE OF MOLECULAR BIOLOGY AND GENETICS   (Ukraine)

^c UNIVERSITÉ DE LYON   (France)

Author keywords

Antibody; Immunosensor; Impedance analysis; Si SiO2

Indexed keywords

ANTIBODIES; ELECTRIC IMPEDANCE MEASUREMENT; ELECTROCHEMICAL ELECTRODES; GRAFTING (CHEMICAL); HETEROJUNCTIONS; POLYMERIC MEMBRANES; SILICA; SILICON WAFERS; SILICONES;

SILICON/SILICA HETEROSTRUCTURES; THREE ELECTRODE ELECTROCHEMICAL CELL;

IMMUNOSENSORS;

EID: 0030122345     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0728(95)04443-4     Document Type: Article

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