High-Tc SQUIDs on silicon substrates

Journal De Physique. IV : JP

Volumn 6, Issue 3, 1996, Pages 361-365

  Seidel, P ^a   Linzen, S ^a   Schmidl, F ^a   Cihar, R ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; HIGH TEMPERATURE SUPERCONDUCTORS; JOSEPHSON JUNCTION DEVICES; OXIDE SUPERCONDUCTORS; SEMICONDUCTING SILICON; SUBSTRATES; YTTRIUM COMPOUNDS;

BUFFER MULTILAYER SYSTEMS; FILM DEPOSITION; FILM PATTERNING; JOSEPHSON STEP EDGE JUNCTIONS; LASER DEPOSITION;

SQUIDS;

EID: 0030120598     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1996355     Document Type: Article

References (11)

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7. C SQUIDs on silicon substrates", to be published.
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