High aspect ratio silicon pillars fabricated by electrochemical etching and oxidation of macroporous silicon

Thin Solid Films

Volumn 276, Issue 1-2, 1996, Pages 29-31

  Lau, H W ^a   Parker, G J ^a   Greef, R ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Electrochemistry; Etching; Oxidation; Silicon

Indexed keywords

ASPECT RATIO; DENSITY (SPECIFIC GRAVITY); ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTROCHEMISTRY; ETCHING; OXIDATION; PHOTOLITHOGRAPHY; SILICA; SILICON NITRIDE; SILICON WAFERS;

INVERTED PYRAMIDS; MACROPOROUS SILICON; SILICON PILLARS;

POROUS SILICON;

EID: 0030120538     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08042-2     Document Type: Article

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