NO gas-sensing characteristics of copper phthalocyanine film prepared by plasma-activated evaporation

Sensors and Actuators, B: Chemical

Volumn 32, Issue 1, 1996, Pages 77-82

  Choi, Chang Gu ^a   Lee, Soonchil ^b   Lee, Won Jong ^b  

^a Deawoo Electronics Components Ltd   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Copper phthalocyanine; Gas sensors; Nitrogen oxide; Plasma activated evaporation

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; MECHANICAL PROPERTIES; NITROGEN OXIDES; PLASMA APPLICATIONS; THIN FILMS;

COPPER PHTHALOCYANINE; GAS SENSORS; PLASMA-ACTIVATED EVAPORATION;

CHEMICAL SENSORS;

EID: 0030114167     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-4005(96)80112-2     Document Type: Article

References (9)

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