Crystallization of amorphous silicon carbide thin films by laser treatment

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 237-241

  De Cesare, G ^a   La Monica, S ^a   Maiello, G ^a   Proverbio, E ^a   Ferrari, A ^a   Dinescu, M ^b   Chitica, N ^b   Morjan, I ^b   Andrei, A ^c  

^a SAPIENZA UNIVERSITY OF ROME   (Italy)

^b INSTITUTE OF ATOMIC PHYSICS   (Romania)

^c INSTITUTE FOR NUCLEAR RESEARCH   (Romania)

Author keywords

Crystallization; Laser treatment; Silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; EXCIMER LASERS; HARDNESS; INFRARED SPECTROSCOPY; LASER APPLICATIONS; MECHANICAL VARIABLES MEASUREMENT; OPTICAL MICROSCOPY; PLASMA APPLICATIONS; PROTECTIVE COATINGS; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON CARBIDE THIN FILMS; INFRARED TRANSMISSION SPECTROSCOPY; LASER INDUCED COMPOSITION EVOLUTION; LASER TREATMENT; MICROHARDNESS MEASUREMENTS; MULTIPULSE ULTRA VIOLET IRRADIATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0030110728     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02720-3     Document Type: Article

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