A new gas purifier for ArF excimer lasers

Review of Scientific Instruments

Volumn 67, Issue 3, 1996, Pages 658-661

  Ito, S ^a   Saito, T ^a   Tada, A ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATED CARBON; CARBON INORGANIC COMPOUNDS; CONTROL EQUIPMENT; EXCIMER LASERS; FILTERS (FOR FLUIDS); FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; GASES; IMPURITIES; MASS SPECTROMETRY; MASS TRANSFER; PURIFICATION;

ARGON FLUORIDE EXCIMER LASERS; CARBON TETRAFLUORIDE; GAS PURIFIERS; LIQUID NITROGEN TRAPS; MASS FLOW CONTROLLERS;

CHEMICAL EQUIPMENT;

EXCIMER; GAS; LASERS; PURIFICATION;

EID: 0030110609     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1146837     Document Type: Article

References (9)

1. M. C. Gower, A. J. Kearsley, and C. E. Webb, IEEE J. Quantum Electron. QE-16, 231 (1980).
2. J. H. Brannon, IEEE J. Quantum Electron. QE-18, 1302 (1982).
3. W. D. Kimura and J. F. Seamans, IEEE J. Quantum Electron. QE-24, 2121 (1988).
4. H. H. Hwang, K. James, R. Hui, and M. J. Kushner, J. Appl. Phys. 69, 7419 (1991).
5. G. Jursih, W. A. Von Drasek, R. K. Brimacombe, and J. Read, Appl. Opt. 31, 1975 (1992).
6. R. Tennant, Laser Focus 17, 65 (1981).
7. M. Arai, S. Ito, and K. Hotta, in Technical Digest, CLEO'91, May 1991 (unpublished), Paper CTha4.
8. P. M. Johnson, N. Keller, and R. E. Turner, Appl. Phys. Lett. 32, 291 (1978)
9. T. Saito, S. Ito, A. Tada, M. Arai, Y. Kajiki, and K. Hotta, in Technical Digest, CLEO Europe'94, August 1994 (unpublished), Paper CTuB6.