Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application

Optics Communications

Volumn 124, Issue 3-4, 1996, Pages 208-215

  Larruquert, Juan Ignacio ^a   Méndez, José Antonio ^a   Aznárez, José Antonio ^a  

^a Consejo Superior de Investigaciones Científicas   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSPACE APPLICATIONS; ALUMINUM; ATOMS; CALCULATIONS; DEGRADATION; INORGANIC COATINGS; METALLIC FILMS; MIRRORS; OXIDATION; OXYGEN; REFLECTOMETERS; VACUUM;

ALUMINUM MIRROR; FAR ULTRAVIOLET; LOW EARTH ORBIT; WAKESHIELD DEVICE;

ULTRAVIOLET RADIATION;

EID: 0030110069     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/0030-4018(95)00679-6     Document Type: Article

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