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Volumn 154, Issue 1, 1996, Pages 5-21

Fundamental gas processes for the CVD diamond growth from H2/C2H2/O2 and Ar/C2H2/O2 mixtures

Author keywords

[No Author keywords available]

Indexed keywords

BINARY MIXTURES; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; FILM GROWTH; MASS SPECTROMETRY; METHANE; OXYGEN; RAMAN SPECTROSCOPY; REDUCTION; THERMODYNAMIC STABILITY;

EID: 0030109651     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211540103     Document Type: Article
Times cited : (4)

References (20)
  • 1
    • 33845374219 scopus 로고
    • M. TSUDA and M. NAKAJIMA, J. Amer. Chem. Soc. 108, 5780 (1985). M. TSUDA, M. NAKAJIMA, and S. OIKAWA, Japan. J. appl. Phys. 26, 527 (1987).
    • (1985) J. Amer. Chem. Soc. , vol.108 , pp. 5780
    • Tsuda, M.1    Nakajima, M.2
  • 11
  • 17
    • 85033833170 scopus 로고
    • Ph.D. Thesis, Kassel
    • R. BECKMANN, Ph.D. Thesis, Kassel 1994.
    • (1994)
    • Beckmann, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.