-
1
-
-
85027126101
-
-
3-64, The Electrochemical Society, Penning-ton, NJ. 1991.
-
T. Ohmi and T. Shibata, "Closed Manufacturing System for Advanced Semiconductor Manufacturing," in Automated Integrated Circuits Manufacturing, ed. V. A. Akins and H. Harada, PV91-5, pp. 3-64, The Electrochemical Society, Penning-ton, NJ. 1991.
-
And T. Shibata, "Closed Manufacturing System for Advanced Semiconductor Manufacturing," in Automated Integrated Circuits Manufacturing, Ed. V. A. Akins and H. Harada, PV91-5, Pp.
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Ohmi, T.1
-
2
-
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85027142566
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1989 Annual Meeting, pp. 196, 9-13 Oct. 1989.
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H. Inaba, T. Ohmi, and T. Takenami, "Particle adhesion to electro-statically-charged wafer," AMERICAN ASSOCIATION FOR AEROSOL RESEARCH-in proceedings of 1989 Annual Meeting, pp. 196, 9-13 Oct. 1989.
-
T. Ohmi, and T. Takenami, "Particle Adhesion to Electro-statically-charged Wafer," AMERICAN ASSOCIATION for AEROSOL RESEARCH-in Proceedings of
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-
Inaba, H.1
-
3
-
-
85027149525
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22nd WORKSHOP ON ULTRA CLEAN TECHNOLOGY, pp. 3-16, 19 Dec. 1992.
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Y. Kasama, K. Mitsumori, T. Akimoto, and A. Nakano, "The present problems of electro static discharge in TFT process" Contamination Free Static Technology in ULSI and TFT LCD Display, 22nd WORKSHOP ON ULTRA CLEAN TECHNOLOGY, pp. 3-16, 19 Dec. 1992.
-
K. Mitsumori, T. Akimoto, and A. Nakano, "The Present Problems of Electro Static Discharge in TFT Process" Contamination Free Static Technology in ULSI and TFT LCD Display
-
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Kasama, Y.1
-
4
-
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0023569884
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753-756, 6-9 Dec. 1987.
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Y. Todokoro, H. Watanabe, H. Takenaka, M. Kishimoto, and A. Kajiya, "E-beam direct wafer writing process using water-soluble conductive layer (WSCL)" International Electron Devices Meeting, pp. 753-756, 6-9 Dec. 1987.
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H. Watanabe, H. Takenaka, M. Kishimoto, and A. Kajiya, "E-beam Direct Wafer Writing Process Using Water-soluble Conductive Layer (WSCL)" International Electron Devices Meeting, Pp.
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Todokoro, Y.1
-
5
-
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85027106763
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-
3, pp. 157-159, 1989.
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S. Sakata and T. Okada, "Dust free ionizer," Ultra Clean Technology, vol. 3, pp. 157-159, 1989.
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And T. Okada, "Dust Free Ionizer," Ultra Clean Technology, Vol.
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Sakata, S.1
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6
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0026900859
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-
5, no. 3, pp. 223-243, Aug. 1992.
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H. Inaba, S. Sakata, T. Yoshida, T. Okada, and T. Ohmi, "Antistatic protection in wafer drying process by spindrying," IEEE Trans. Semiconductor Manufacturing, vol. 5, no. 3, pp. 223-243, Aug. 1992.
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S. Sakata, T. Yoshida, T. Okada, and T. Ohmi, "Antistatic Protection in Wafer Drying Process by Spindrying," IEEE Trans. Semiconductor Manufacturing, Vol.
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Inaba, H.1
-
7
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0028447356
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33, pp. 15-42, 1994.
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H. Inaba, T. Ohmi, T. Yoshida, and T. Okada, "Neutralization of static electricity by soft X-rays and vacuum UV radiation," Journal of Electrostatics, vol. 33, pp. 15-42, 1994.
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T. Ohmi, T. Yoshida, and T. Okada, "Neutralization of Static Electricity by Soft X-rays and Vacuum UV Radiation," Journal of Electrostatics, Vol.
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-
Inaba, H.1
-
9
-
-
0038800802
-
-
5, pp. 369-390, 1965.
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F. R. Gilmore, "Potential energy curves for N2, NO, O2 and corresponding ions" J. Quant. Spectrosc. Radiât. Transfer. , vol. 5, pp. 369-390, 1965.
-
"Potential Energy Curves for N2, NO, O2 and Corresponding Ions" J. Quant. Spectrosc. Radiât. Transfer. , Vol.
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Gilmore, F.R.1
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11
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85027150392
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30th Meeting of Japan Health Physics Society, p. 3, May 1995.
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H. Inaba, S. Iwanami, "Posimetry of Ultrasoft X-Rays for Protection," Proceedings of the 30th Meeting of Japan Health Physics Society, p. 3, May 1995.
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S. Iwanami, "Posimetry of Ultrasoft X-Rays for Protection," Proceedings of the
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Inaba, H.1
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