Orientation of Ni-Cr thin films with an underlying Ti layer

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 3 A, 1996, Pages

  Iida, Atsuko ^a   Nakamura, Shin Ichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

HRTEM; Ni Cr; Preferred orientation; Thin film; Ti

Indexed keywords

CRYSTAL ORIENTATION; FILM PREPARATION; NICKEL ALLOYS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

PREFERRED ORIENTATION;

METALLIC FILMS;

EID: 0030109424     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l335     Document Type: Article

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