|
|
|
Volumn 83, Issue 3, 1996, Pages
|
|
Influence of chloride ion on electrocrystallization of copper
a
a
NONE
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
CATHODES;
CHLORINE COMPOUNDS;
COPPER;
CRYSTAL ORIENTATION;
CURRENT DENSITY;
ELECTROLYSIS;
IONS;
MORPHOLOGY;
SCANNING ELECTRON MICROSCOPY;
SURFACE PROPERTIES;
THERMAL EFFECTS;
X RAY DIFFRACTION ANALYSIS;
CHLORIDE ION;
CIRCULATION RATE;
COPPER CONCENTRATION;
ELECTROCRYSTALLIZATION;
ELECTROLYSIS PARAMETER;
OPEN CHANNEL CELL;
ELECTRODEPOSITION;
|
|
EID: 0030109349
PISSN: 03603164
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
|
Times cited : (4)
|
|
References (23)
|
