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Volumn 79, Issue 5, 1996, Pages 2787-2789

Structural relaxation and stress reduction in hydrogenated silicon oxide films

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; FILM GROWTH; HYDROGEN; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; OXIDES; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; RELAXATION PROCESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESSES;

EID: 0030109297     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361111     Document Type: Article
Times cited : (4)

References (10)
  • 6
    • 0004198677 scopus 로고
    • Academic, New York, Chaps. 2 and 3
    • HIPRA, Charles Evans & Associates Co., Ltd., presented in the technical report of Foundation for Promotion of Material Science and Technology of Japan, 1994 (in Japanese). This simulation program is based on the following reference: W.-K. Chu, J. W. Mayer, and M. A. Nicolet, Backscattering Spectwscopy (Academic, New York, 1989), Chaps. 2 and 3.
    • (1989) Backscattering Spectwscopy
    • Chu, W.-K.1    Mayer, J.W.2    Nicolet, M.A.3
  • 8
  • 9
    • 0020136505 scopus 로고
    • F. L. Galeener, J. Non-Cryst. Solids 49, 53 (1982); F. L. Galeener, Solid State Commun. 44, 1037 (1982).
    • (1037) Solid State Commun. , vol.44 , pp. 1982
    • Galeener, F.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.