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Volumn 79, Issue 5, 1996, Pages 2787-2789
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Structural relaxation and stress reduction in hydrogenated silicon oxide films
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
FILM GROWTH;
HYDROGEN;
MAGNETRON SPUTTERING;
MATHEMATICAL MODELS;
MOLECULAR STRUCTURE;
OXIDES;
RAMAN SPECTROSCOPY;
REFRACTIVE INDEX;
RELAXATION PROCESSES;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
STRESSES;
BONDING ANGLES;
ELASTIC RECOIL DETECTION;
HYDROGENATED SILICON OXIDE;
STRESS REDUCTION;
THICK FILMS;
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EID: 0030109297
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.361111 Document Type: Article |
Times cited : (4)
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References (10)
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