Photopolymerization of styrene, p-chlorostyrene, methyl methacrylate, and butyl methacrylate with polymethylphenylsilane as photoinitiator

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 34, Issue 4, 1996, Pages 679-685

  Chen, H B ^a   Chang, T C ^b   Chiu, Y S ^c   Ho, S Y ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL DEFENSE UNIVERSITY   (Taiwan)

^c CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Monomer dipole moment; Polymeric photoinitiator; Polymethylphenylsilane; Rate constants

Indexed keywords

FREE RADICALS; INITIATORS (CHEMICAL); MONOMERS; PHOTOCHEMICAL REACTIONS; POLYMETHYL METHACRYLATES; POLYSTYRENES;

BUTYL METHACRYLATE; CHLOROSTYRENE; MONOMER DIPOLE MOMENT; PHOTOINITIATOR; PHOTOPOLYMERIZATION; POLYMETHYLPHENYSILANE;

POLYMERIZATION;

EID: 0030108271     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0518(199603)34:4<679::AID-POLA15>3.0.CO;2-L     Document Type: Article

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