The effect of preheating treatment on anodic Al2O3 formed on sputtered Al thin films

Journal of the Electrochemical Society

Volumn 143, Issue 3, 1996, Pages 984-990

  Chiu, Re Long ^a   Chang, Peng Heng ^a   Tung, Chi Hang ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS MATERIALS; ANNEALING; ANODIC OXIDATION; CRYSTALLINE MATERIALS; CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC PROPERTIES; METAL INSULATOR BOUNDARIES; OXIDES; PHASE TRANSITIONS; TRANSMISSION ELECTRON MICROSCOPY; VOLTAGE MEASUREMENT;

ALUMINUM THIN FILMS; AMORPHOUS ANODIC OXIDE; BOROPHOSPHOSILICATE GLASS SILICA SILICON SUBSTRATES; METAL INSULATOR METAL STRUCTURE;

ALUMINA;

EID: 0030108109     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836569     Document Type: Article

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