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Volumn 371, Issue 3, 1996, Pages 575-577
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A microscopic explanation for type inversion and the annealing behaviour of radiation damaged silicon detectors
a a,c a b b |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CRYSTAL DEFECTS;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
IRRADIATION;
LEAKAGE CURRENTS;
NEUTRONS;
PHOSPHORUS;
RADIATION DAMAGE;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MODELS;
BAND GAP;
LARGE HADRON COLLIDER;
NEUTRON FLUENCE;
PHOSPHOROUS REMOVAL RATE;
POISSON EQUATION;
SILICON DETECTORS;
TYPE INVERSION;
VACANCY PHOSPHOROUS COMPLEXES;
RADIATION DETECTORS;
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EID: 0030108025
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-9002(95)01435-7 Document Type: Article |
Times cited : (7)
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References (13)
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