Growth Rate and Microstructure of Mo Film by Chemical- Vapour- Deposition

Materials Transactions, JIM

Volumn 37, Issue 3, 1996, Pages 283-288

  Yoshikawa, Noboru ^a   Kikuchi, Atsushi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Chemical vapour deposition; Decomposition reaction; Gas solid interface; Growth rate; Mass transfer; Microstructure; Mo film; Morphology; Simulation; Structure zone model

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; DECOMPOSITION; FILM GROWTH; GRAIN SIZE AND SHAPE; MASS TRANSFER; MOLYBDENUM; MORPHOLOGY; PHASE INTERFACES; THERMAL EFFECTS;

STRUCTURE ZONE MODEL;

METALLIC FILMS;

EID: 0030107879     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.37.283     Document Type: Article

References (14)

1. M. Fukutomi, M.Okada and RAVatanabe : J. Less Common Met, 48 (1976), 65.
2. S.M. Sze : VLSI TECHNOLOGY, McGraw-Hill Inc., (1984), 360.
3. J.E.Cline and J.Wilff: J. Electrochem. Soc., 106 (1959), 444.
4. S. Ito, S.Ueshima and N.Yoneda : Kinzokuhyoumengigyutsu, 39 (1988), 30.
5. W.A.Bryanfc J.Mater. Sei., 12(1977) 1285.
6. H.Moffat and K.F.Jensen : J.Ciyst. Growth, 77 (1986),108.
7. C.R.Klcijn : J.EIectrochem. Soc., 138 (1991), 2190.
8. B.A.Movchan and A.V.Demchisin: Fiz. Métal. Metalloved,28(1969)653.
9. J.A.Thornton : Ann. Rev. Mater. Sei., 7 (1977) 239.
10. S.A.Gokoglu : Mater. Res. Symp. Proc., "Chemical Vapor Deposition of Refractory Metal and Ceramics II " 250 (1992)17.
11. N.Yoshifcawa and A.Kikuchi : J.Mater. Res., 10(1995),2801.
12. Brewer.L and R.H.Lamoreaux : Thermochemical Properties of Molybdenum and its Compounds, Atomic Energy Rev. No.7 Int, At. En.Agency, Viena (1980)
13. N.Yoshikawa and A.Kikuchi : Reported in Annual Meeting of JIM, April (1994)
14. C.H.J.Van den Breckel and A.KJansen: J.CrysL Growth 43(1978)488.