Argon desorption as a tool to study the growth of molecular layers

Surface Science

Volumn 348, Issue 3, 1996, Pages 370-378

  Stichler, M ^a   Zebisch, P ^a,c   Weinelt, M ^a,d   Steinruck H P ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

^c MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Adsorption kinetics; Argon; Benzene; Growth; Nickel; Thermal desorption spectroscopy; Wetting

Indexed keywords

ADSORPTION; ARGON; BENZENE; DEFECTS; GROWTH (MATERIALS); NICKEL; SPECTROSCOPY; SUBSTRATES; SURFACES; TEMPERATURE; TEMPERATURE PROGRAMMED DESORPTION; WETTING;

ADSORPTION KINETICS; ARGON DESORPTION; MOLECULAR LAYER GROWTH; THERMAL DESORPTION SPECTROSCOPY;

SURFACE PROPERTIES;

EID: 0030107115     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01036-X     Document Type: Article

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